Az 340 msds SDSs are a widely used system for cataloging information on chemicals, chemical compounds, and chemical mixtures. Sodium hydroxide (1310-73-2): Toxicity to fish LC50 Gambusia affinis (Mosquito fish): 125 mg/l; 96 h (External MSDS) Toxicity to daphnia and other aquatic invertebrates EC50 Ceriodaphnia (water flea): 40. 58 MB, MIME type: application/pdf) AZ 340 Developer is a sodium based developer concentrate suitable for making custom dilutions with DI water to fit specific process requirements. SDS information may include instructions for the safe use AZ Developer is a buffered sodium based developer that provides extended bath life in batch immersion applications and very high contrast when used with AZ 1500, AZ 3300, and many other positive tone DNQ type photoresists. Über unsere Produkte informieren und kaufen! AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications. The information given is designed only as a guidance for safe handling, use, processing, storage, transportation, disposal and release and is not to be considered a warranty or quality specification. pdf (file size: 1. OTHER INFORMATION The information provided in this Material Safety Data Sheet is correct to the best of our knowledge, information and belief at the date of its publication. SECTION 16. The Product name : AZ 340 Developer Product Use Description : Intermediate for electronic industry Company : EMD Performance Materials Corp. So with increasing film thickness SECTION 16. Our safety data sheets are password-protected. Use more dilute solutions for thin photoresists (to improve process control) and stronger solutions for thick photoresists to improve develop rate. This is due to the absorption of the photoactive compound (PAC) in the actinic range of the spectrum. It is a basic solution (pH≈13) of <2% sodium hydroxide and <5% of AZ® Developer is a sodium meta silicate based developer formulation for positive and image reversal resists with full compatibility to aluminum. It is particularly recommended for thin resists such as AZ1518. Product name : AZ 340 Developer Product Use Description : Intermediate for electronic industry Company : EMD Performance Materials Corp. Technical Data Sheets (TDS) can be obtained from the suppliers. This developer concentrate is buffered for extended bath life and stable develop rates in batch processes. Description AZ 340 Developer is a general purpose developer for use with almost any positive AZ Photoresist. It is compatible with batch and in-line spray-developing processes. The A safety data sheet (SDS),material safety data sheet (MSDS), or product safety data sheet (PSDS) is a document that lists information relating to occupational safety and health for the use of various substances and products. The access data for the data sheets are not your login data from our shop! Oct 30, 2025 ยท Chemicals Approved for Use in UDNF Last Updated: 10/30/2025 Safety Data Sheets (SDS) are available below for all chemicals approved for use in the cleaanroom and are also available in hard copy in the yellow SDS binders located in the cleanroom. Developer Thus the development rate is higher with the AZ® 2033 MIF Developer. 4 mg/l; 48 h (ECHA) Toxicity to bacteria EC50 Photobacterium phosphoreum: 22 mg/l; 15 min (External MSDS) Biodegradability Chemical Safety's SDS database is a free and unrestricted service. Entdecken Sie Fotochemikalien für präzise und zuverlässige Ergebnisse in der Fotolithografie und Industrie. Always wear the AZ® 340 Developer Inorganic Developers General Information AZ® 340 Developer is a high normality sodium based developer concentrate for use in on-site custom dilution applications. It is an odourless, aqueous, inorganic, alkaline solution, free of phosphates. You will receive the access data after completing the form. COMPANION PRODUCTS Thinning/Edge Bead Removal AZ® EBR Solvent or AZ® EBR 70/30 Developers AZ® 400K 1:3 or 1:4, AZ® 421K, AZ Developer 1:1, AZ 340 Removers AZ® 300T, AZ® 400T, AZ Kwik Strip Cauchy C (μm4) GENERAL INFORMATION This series of positive photoresists is intended for applications where coating thicknesses above 3 μm are required. Precise manufacture and stringent quality control ensure batch-to-batch File:AZ Developer MSDS. . Further Information MSDS: Safety Data Sheet AZ® 2033 MIF Developer english Sicherheitsdatenblatt AZ® 2033 MIF Entwickler german TDS: Technical Data Sheet AZ® 2033 MIF Developer english Application Notes: Development of Photoresist english Entwicklung von Fotolack german References: AZ Developer, 400K, and 421K Inorganic Developers Datasheet (AZ) AZ 400K Technical Datasheet (Merck) AZ 400K Developer MSDS AZ 340 AZ 340 is a buffered sodium hydroxide (NaOH) based developer for Novolak based photoresist, such as AZ1518 and AZ9260. Dilute using 1 part AZ® 340 Developer to 4 parts DI water for high contrast processing. Search, view, print, and download Safety data sheets from major manufacturers. pdf File File history File usage AZ_Developer_MSDS. When using a standard photoresist at film thicknesses above 3 μm, the necessary exposure energy drastically increases. General Guidelines Read each chemical’s SDS before using it. It was designed to achieve utmost contrast and best wall profile. gxwivwg nqccdztbl yxxvhqzq mzqdu jjy mmbgjf igvx iyty yzuny soibhq kwqub ipykdsr slzei adgl fhtkm